Chemical Vapor Deposition of Iron, Iron Carbides, and Iron Nitride Films from Amidinate Precursors
نویسندگان
چکیده
منابع مشابه
Heterocyclic dithiocarbamato-iron(III) complexes: single-source precursors for aerosol-assisted chemical vapour deposition (AACVD) of iron sulfide thin films.
Tris-(piperidinedithiocarbamato)iron(III) (1) and tris-(tetrahydroquinolinedithiocarbamato)iron(iii) (2) complexes have been synthesized and their single-crystal X-ray structures were determined. Thermogravimetric analysis (TGA) of the complexes showed decomposition to iron sulfide. Both complexes were then used as single-source precursors for the deposition of iron sulfide thin films by aeroso...
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Smooth and continuous films of nickel nitride (NiNx) with excellent step coverage were deposited from a novel nickel amidinate precursor, Ni(MeC(NBu)2)2, and either ammonia (NH3) or amixture of NH3 and hydrogen (H2) gases as co-reactants. The reactants were injected together in direct-liquidinjection chemical vapor deposition (DLI-CVD) processes at substrate temperatures of 160-200 C. Depending...
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 2010
ISSN: 0013-4651
DOI: 10.1149/1.3430105